Changes

#60 (Aug 2, 2016 11:02:50 PM)

1307. Add flags to link to opengl and glu libraries, apparently +opengl is not enough for this in mingw. — colombo / detail

#59 (Aug 2, 2016 10:52:24 PM)

1306. Fixed some code that did not compile on mingw. Removed random walk doping from process list. — colombo / detail

#58 (Aug 2, 2016 10:38:24 PM)

1305. Merged with OctreeNoVoxel branch to pull latest changes. Removed the CCA wet etch option and random walk doping option from the UI. — colombo / detail

#57 (Aug 15, 2014 10:36:24 PM)

1197. Fixes a bug with PVD operations that might cause bugs when running other processes later. — colombo / detail

#56 (Aug 13, 2014 1:30:24 AM)

1192. Modified the doping and ion implantation processes to allow for selection of materials that can be doped, using the compatible materials dialog. Also changed selection of P N type to selection of a material, so the user can have P, N and create other materials such as P+ and N+. Changed batch run to reflect theses changes, so old files will stop working if they use diffusion of any type. Added colors to the edit materials dialog. — colombo / detail

#55 (Aug 12, 2014 12:33:24 AM)

1191. Modified simulation so oxidation and doping (both by diffusion and implantation) can be done on a set of user selected materials. Removed repeated Config menu. This version requires deleting previous Material and Process XML files in the user folder. — colombo / detail

#54 (Aug 6, 2014 10:30:24 PM)

1187. Readded dialogs to create materials and change which materials can be used with which process. Added a "New" function that will clear away memory. Fixes #5, #6, #8, #2. — colombo / detail